Application of Triaryl Phosphate to Photosensitive Materials (III): Structure and Reactivity of Methyl-Substituted Triaryl Phosphate

Author： Naito Ikuo Sugao Yoshinori Sugiyama Kosuke Kobayashi Keito

Publisher： Society for Imaging Science and Technology

ISSN： 1943-3522

Source： Journal of Imaging Science and Technology, Vol.42, Iss.2, 1998-03, pp. : 163-168

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

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