Oxidation–reduction processes in halide and oxohalide niobium containing melts. Part I: Interaction of fluoride–chloride and oxofluoride–chloride Nb(V) melts with niobium oxides

Author： Grinevitch V.V.   REZNICHENKO/snm V.A.   Model M.S.   Kuznetsov S.A.   Polyakov E.G.   Stangrit P.T.  

Publisher： Springer Publishing Company

ISSN： 0021-891X

Source： Journal of Applied Electrochemistry, Vol.29, Iss.6, 1999-06, pp. : 697-706

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Niobium plating processes in alkali chloride melts

By Gillesberg B.   Barner J.H.V.   Bjerrum N.J.   Lantelme F.  

Journal of Applied Electrochemistry, Vol. 29, Iss. 8, 1999-08 ,pp. : 939-949

Springer Publishing Company

Access to resources Recommend Favorite

Electrochemical behavior of tantalum(V) oxide in chloride-fluoride melts

By Gasviani N.   Khutsishvili M.   Abazadze L.   Gasviani S.  

Russian Journal of Electrochemistry, Vol. 43, Iss. 2, 2007-02 ,pp. : 211-216

MAIK Nauka/Interperiodica

Access to resources Recommend Favorite

Standard rate constants of charge transfer for Nb(V)/Nb(IV) redox couple in chloride-fluoride melts: Experimental and calculation methods

By Popova A.   Kremenetsky V.   Solov’ev V.   Chernenko L.   Kremenetskaya O.   Fofanov A.   Kuznetsov S.  

Russian Journal of Electrochemistry, Vol. 46, Iss. 6, 2010-06 ,pp. : 671-679

MAIK Nauka/Interperiodica

Access to resources Recommend Favorite

Electrochemical impedance and cyclic voltammetry study of the influence of oxide on the redox chemistry of niobium and tantalum in chloride melts

By Stohr U.   Bandi P.R.   Matthiesen F.   Freyland W.  

Electrochimica Acta, Vol. 43, Iss. 5, 1998-01 ,pp. : 569-578

Elsevier

Access to resources Recommend Favorite

Mechanism and kinetics of niobium ion reduction in LiF-NaF-K 2 NbF 7 melts

By Van V.   Silny A.   Danek V.  

Electrochemistry Communications, Vol. 1, Iss. 8, 1999-08 ,pp. : 354-359

Elsevier

Access to resources Recommend Favorite