The etching behavior of n-GaP in aqua regia solutions

Author： Chang K.   Lee C.   Hsu J.   Hsieh H.   Shih H.  

Publisher： Springer Publishing Company

ISSN： 0021-891X

Source： Journal of Applied Electrochemistry, Vol.35, Iss.1, 2005-01, pp. : 77-84

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