An XPS and thermogravimetric study of oxidized AlN and AlN–Si3N4 layers deposited by liquid-phase chemical vapour deposition

Author： Perrem R.   Henry F.   Peraudeau G.   Armas B.   Berjoan R.   Beche E.  

Publisher： Springer Publishing Company

ISSN： 0022-2461

Source： Journal of Materials Science, Vol.32, Iss.5, 1997-05, pp. : 1305-1312

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