Microstructure of (100) silicon wafer implanted by 1 MeV Ru+ ions

Author： Chen Y.L.   Shao G.   Sharpe J.   Gwilliam R.M.   Kirkby K.R.   Homewood K.P.   Goringe M.J.  

Publisher： Springer Publishing Company

ISSN： 0022-2461

Source： Journal of Materials Science, Vol.36, Iss.2, 2001-01, pp. : 321-327

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