Preferred orientations of NiO thin films prepared by RF magnetron sputtering

Author: Ryu H. W.   Choi G. P.   Lee W. S.   Park J. S.  

Publisher: Springer Publishing Company

ISSN: 0022-2461

Source: Journal of Materials Science, Vol.39, Iss.13, 2004-07, pp. : 4375-4377

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