Deposition of CNx thin films by plasma-activated chemical vapour deposition using various precursors as carbon source

By Gruger H.   Selbmann D.   Wolf E.   Leonhardt A.  

Journal of Materials Science, Vol. 32, Iss. 11, 1997-11 ,pp. : 2849-2853

Springer Publishing Company

Access to resources Recommend Favorite

Silicon oxide thin films prepared by a photo-chemical vapour deposition technique

By Jana T.   Ghosh S.   Ray S.  

Journal of Materials Science, Vol. 32, Iss. 18, 1997-12 ,pp. : 4895-4900

Springer Publishing Company

Access to resources Recommend Favorite

Conductive indium-doped zinc oxide films prepared by atmospheric-pressure chemical vapour deposition

By Nishino J.   Kawarada T.   Ohshio S.   Saitoh H.   Maruyama K.   Kamata K.  

Journal of Materials Science Letters, Vol. 16, Iss. 8, 1997-08 ,pp. : 629-631

Springer Publishing Company

Access to resources Recommend Favorite

The Chemical and Morphological Properties of Boron–Carbon Alloys Grown by Plasma-Enhanced Chemical Vapour Deposition

By Zhang D.   Mcilroy D.N.   O'Brien W.L.   de Stasio G.  

Journal of Materials Science, Vol. 33, Iss. 20, 1998-10 ,pp. : 4911-4915

Springer Publishing Company

Access to resources Recommend Favorite

Preparation of transparent water-repellent films by radio-frequency plasma-enhanced chemical vapour deposition

By Hozumi A.   Sekoguchi H.   Kakinoki N.   Takai O.  

Journal of Materials Science, Vol. 32, Iss. 16, 1997-12 ,pp. : 4253-4259

Springer Publishing Company

Access to resources Recommend Favorite