Amorphous indium tungsten oxide films prepared by DC magnetron sputtering

By Abe Y.   Ishiyama N.   Kuno H.   Adachi K.  

Journal of Materials Science, Vol. 40, Iss. 7, 2005-04 ,pp. : 1611-1614

Springer Publishing Company

Access to resources Recommend Favorite

Bias voltage dependence properties of cadmium oxide films deposited by d.c. reactive magnetron sputtering

By Mohan Babu P.   Venkata Rao G.   Sreedhara Reddy P.   Uthanna S.  

Journal of Materials Science: Materials in Electronics, Vol. 15, Iss. 6, 2004-06 ,pp. : 389-394

Springer Publishing Company

Access to resources Recommend Favorite

The influence of substrate temperature on the properties of aluminum-doped zinc oxide thin films deposited by DC magnetron sputtering

By Moon Yeon-Keon   Kim Se-Hyun   Park Jong-Wan  

Journal of Materials Science: Materials in Electronics, Vol. 17, Iss. 12, 2006-12 ,pp. : 973-977

Springer Publishing Company

Access to resources Recommend Favorite

Effect of sputtering power on microstructure of dielectric ceramic thin films by RF magnetron sputtering method using (Ba_0.3Sr_0.7)(Zn_1/3Nb_2/3)O₃ as target

By Shi Feng  

Journal of Materials Science: Materials in Electronics, Vol. 22, Iss. 9, 2011-09 ,pp. : 1290-1296

Springer Publishing Company

Access to resources Recommend Favorite

Synthesis and Characterization of Nb-Doped TiO₂ Thin Films Prepared by RF Magnetron Sputtering

By  

Advanced Materials Research, Vol. 2015, Iss. 1117, 2015-08 ,pp. : 139-142

Trans Tech Publications

Access to resources Recommend Favorite