Memory characteristics of Al₂O₃/LaAlO₃/SiO₂ multilayer structures with tunnel oxide thickness variation

Author： Cha Seung-Yong Kim Hyo-June Choi Doo-Jin

ISSN： 0022-2461

Source： Journal of Materials Science, Vol.45, Iss.19, 2010-10, pp. : 5223-5227

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