Thin film deposition using a plasma source with a hot refractory anode vacuum arc

Author: Beilis Isak   Koulik Yosef   Boxman Raymond   Arbilly David  

Publisher: Springer Publishing Company

ISSN: 0022-2461

Source: Journal of Materials Science, Vol.45, Iss.23, 2010-12, pp. : 6325-6331

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract