Impact of the electrodeposition chemistry used for TSV filling on the microstructural and thermo-mechanical response of Cu

Author: Okoro Chukwudi   Labie Riet   Vanstreels Kris   Franquet Alexis   Gonzalez Mario   Vandevelde Bart   Beyne Eric   Vandepitte Dirk   Verlinden Bert  

Publisher: Springer Publishing Company

ISSN: 0022-2461

Source: Journal of Materials Science, Vol.46, Iss.11, 2011-06, pp. : 3868-3882

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Abstract