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Author: Chang Chung-Liang Lin Tser-Sheng
Publisher: Springer Publishing Company
ISSN: 0272-4324
Source: Plasma Chemistry and Plasma Processing, Vol.25, Iss.4, 2005-08, pp. : 387-401
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
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