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Author: Fan Hong-Yu Shi Chuan Li Xiao-Song Yang Xue-Feng Xu Yong Zhu Ai-Min
Publisher: Springer Publishing Company
ISSN: 0272-4324
Source: Plasma Chemistry and Plasma Processing, Vol.29, Iss.1, 2009-02, pp. : 43-53
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
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