Author： Halder Sandip Schneller Theodor Waser Rainer Thomas Florian
Publisher： Springer Publishing Company
ISSN： 0928-0707
Source： Journal of Sol-Gel Science and Technology, Vol.42, Iss.3, 2007-06, pp. : 203-207
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Nickel thin films have been sputtered on standard Si/SiO2 substrates with TiO2 as an adhesive layer. The thermal stability of these substrates was analyzed. SEM images show an increase in grain size with annealing temperature. They were found to be stable till 800°C, beyond which the nickel layer disintegrated. These substrates were used for deposition of BaTiO3 and (Ba,Sr)TiO3 dielectric thin films under a reducing atmosphere. The dielectric thin films were processed with various pyrolysis and annealing temperatures in order to optimize the dielectric properties. Increased pyrolysis temperatures showed an increase in the grain size. Results on these nickelised substrates were finally compared with dielectric films deposited on platinized silicon substrates under identical conditions but crystallized in an oxygen atmosphere.
Related content
By Aidoud Amina Maroutian Thomas Matzen Sylvia Agnus Guillaume Amrani Bouhalouane Driss-Khodja Kouider Aubert Pascal Lecoeur Philippe
EPJ Applied Physics (The), Vol. 81, Iss. 2, 2018-06 ,pp. :
Access to resources
Recommend
Microstructure and photoluminescence properties of Nd-doped (Ba,Sr)TiO3 thin films
Journal of Physics: Conference Series , Vol. 152, Iss. 1, 2009-03 ,pp. :
Access to resources