Thermal stability of hafnium silicate dielectric films deposited by a dual source liquid injection MOCVD

Author: Chalker Paul R.   Marshall Paul A.   Potter Richard J.   Joyce Timothy B.   Jones Anthony C.   Taylor Stephen   Noakes Timothy C. Q.   Bailey P.  

Publisher: Springer Publishing Company

ISSN: 0957-4522

Source: Journal of Materials Science: Materials in Electronics, Vol.15, Iss.11, 2004-11, pp. : 711-714

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