Chemical mechanical polishing of tantalum: oxidizer and pH effects

Author: Du T.   Tamboli D.   Desai V.   Chathapuram V. S.   Sundaram K. B.  

Publisher: Springer Publishing Company

ISSN: 0957-4522

Source: Journal of Materials Science: Materials in Electronics, Vol.15, Iss.2, 2004-02, pp. : 87-90

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract