The effect of He or Ar/O₂ plasma treatment on Si surface prior to chemical vapor deposition of SiO₂

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Journal of Materials Science: Materials in Electronics, Vol. 15, Iss. 1, 2004-01 ,pp. : 37-41

Springer Publishing Company

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Reactive ion etching of diamond in CF4, O2, O2 and Ar-based mixtures

By Leech P.W.   Reeves G.K.   Holland A.  

Journal of Materials Science, Vol. 36, Iss. 14, 2001-07 ,pp. : 3453-3459

Springer Publishing Company

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Influence of alumina content on the nucleation crystallization and microstructure of barium fluorphlogopite glass-ceramics based on 8SiO₂·y Al₂O₃·4MgO·2MgF₂·BaO Part II Microstructure, microhardness and machinability

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Journal of Materials Science, Vol. 39, Iss. 7, 2004-04 ,pp. : 2509-2515

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Influence of alumina content on the nucleation crystallization and microstructure of barium fluorphlogopite glass-ceramics based on 8SiO₂·YAl₂O₃4MgO2MgF₂BaO Part I Nucleation and crystallization behaviour

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Journal of Materials Science, Vol. 39, Iss. 7, 2004-04 ,pp. : 2499-2507

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SiC and Si3N4 recession due to SiO2 scale volatility under combustor conditions

By Smialek James L.   Robinson R. Craig   Opila Elizabeth J.   Fox Dennis S.   Jacobson Nathan S.  

Advanced Composite Materials, Vol. 8, Iss. 1, 1999-01 ,pp. : 33-45

Taylor & Francis Ltd

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