Polycrystalline Si1-xGex thin film deposition by rapid thermal chemical vapor deposition

Author: Park Young-Bae   Choi Yong-Woo   Li Xiaodong  

Publisher: Springer Publishing Company

ISSN: 0957-4522

Source: Journal of Materials Science: Materials in Electronics, Vol.17, Iss.1, 2006-01, pp. : 27-33

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Abstract