Indentation and scratch tests on sputtered amorphous CN X films deposited on plasma-nitrided Ti-6Al-4V

Author: Fu Yongqing   Loh Nee   Yan Bibo   Wei Jun  

Publisher: Springer Publishing Company

ISSN: 1059-9495

Source: Journal of Materials Engineering and Performance, Vol.9, Iss.5, 2000-10, pp. : 499-505

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract