Modeling of ion-implanted arsenic diffusion in a polysilicon-silicon system

Author: Velichko O.   Komarov F.   Lukanov N.   Muchinskii A.   Prokhorenko N.   Tsurko V.  

Publisher: Springer Publishing Company

ISSN: 1062-0125

Source: Journal of Engineering Physics and Thermophysics, Vol.70, Iss.6, 1997-11, pp. : 988-996

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract