Electrical properties of nanoporous F doped SiO2 low-k thin films prepared by sol-gel method with catalyst HF

Author: He Zhi-Wei   Liu Xue-Qin   Xu Da-Yin   Guo Yong-Ping   Wang Yin-Yue  

Publisher: Springer Publishing Company

ISSN: 1380-2224

Source: Journal of Porous Materials, Vol.13, Iss.3, 2006-08, pp. : 413-417

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Abstract