

Author: Hafiz J. Mukherjee R. Wang X. Cullinan M. Heberlein J.V.R. McMurry P.H. Girshick S.L.
Publisher: Springer Publishing Company
ISSN: 1388-0764
Source: Journal of Nanoparticle Research, Vol.8, Iss.6, 2006-12, pp. : 995-1002
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Abstract
The synthesis of silicon nanowires that are densely coated with silicon nanoparticles is reported. These structures were produced in a two-step process, using a method known as hypersonic plasma particle deposition. In the first step, a Ti–Si nanoparticle film was deposited. In the second step the Ti-source was switched off, and nanoparticle-coated nanowires grew under the simultaneous action of Si vapor deposition and bombardment by Si nanoparticles. Total process time, including both steps, equaled 5 min, and resulted in formation of a dense network of randomly oriented nanowires covering1.5 cm2 of substrate area. The nanowires are composed of single-crystal Si. The diameters of the nanowires vary over the range 100–800 nm. Each nanowire has a crystalline TiSi2 catalyst particle, believed to have been solid during nanowire growth, at its tip.
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