Thermogravimetric Study of Volatile Precursors For Chemical Thin Film Deposition: Estimation of vapor pressures and source temperatures

Author: Niskanen A.   Hatanpää T.   Ritala M.   Leskelä M.  

Publisher: Springer Publishing Company

ISSN: 1388-6150

Source: Journal of Thermal Analysis and Calorimetry, Vol.64, Iss.3, 2001-06, pp. : 955-964

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