Recent advances in modulated pulsed power magnetron sputtering for surface engineering

Author： Lin Jianliang   Sproul William   Moore John   Wu Zhili   Lee Sabrina   Chistyakov Roman   Abraham Bassam  

Publisher： Springer Publishing Company

ISSN： 1543-1851

Source： JOM, Vol.63, Iss.6, 2011-06, pp. : 48-58

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Power Factor of Germanium Antimony Tellurium Thin Film on Al2O3 Ceramic Substrate Deposited by Pulsed–DC Magnetron Sputtering

By  

Key Engineering Materials, Vol. 2016, Iss. 675, 2016-02 ,pp. : 257-260

Trans Tech Publications

Access to resources Recommend Favorite

Pulse Magnetron Sputtering with high power density – an attempt at a critical evaluation

By  

IOP Conference Series: Materials Science and Engineering, Vol. 39, Iss. 1, 2012-09 ,pp. : 41-45

IOP Publishing

Access to resources Recommend Favorite

Plasma self-organisation in High Power Impulse Magnetron Sputtering Discharges

By  

IOP Conference Series: Materials Science and Engineering, Vol. 39, Iss. 1, 2012-09 ,pp. : 67-72

IOP Publishing

Access to resources Recommend Favorite

Domino Platform: PVD Coaters for Arc Evaporation and High Current Pulsed Magnetron Sputtering

By  

IOP Conference Series: Materials Science and Engineering, Vol. 39, Iss. 1, 2012-09 ,pp. : 16-23

IOP Publishing

Access to resources Recommend Favorite

Recent advances in pulsed current electrodeposition: a brief review

By Larson C.   Farr J. P. G.  

Transactions of the Institute of Metal Finishing, Vol. 88, Iss. 5, 2010-09 ,pp. : 237-242

Maney Publishing

Access to resources Recommend Favorite