Simple and Practical Protocol for the Silylation of Phenol Derivatives Using Reusable NaHSO4 Dispread on Silica Gel Under Neutral Conditions

Author: Khalili Mahideh   Ghafuri Hossein   Mojahedi-Jahromi Samaneh   Hashemi Mohammed  

Publisher: Taylor & Francis Ltd

ISSN: 1042-6507

Source: Phosphorus, Sulfur, and Silicon and the Related Elements, Vol.182, Iss.1, 2007-01, pp. : 175-179

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