Growth of (Ba,Sr)TiO3 Thin Films by MOCVD: Stoichiometry Effects

Author： Ehrhart P. Fitsilis F. Regnery S. Waser R. Schienle F. Schumacher M. Juergensen H. Krumpen W.

ISSN： 1058-4587

Source： Integrated Ferroelectrics, Vol.45, Iss.1, 2002-01, pp. : 59-68

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