Na0.5K0.5NbO3 Thin Films for MFIS_FET Type Non-Volatile Memory Applications

Author: Cho Choong-Rae   Park Sung-Hyuk   Moon Byung-Moo   Sundqvist Jonas   Hårsta Anders   Grishin Alex  

Publisher: Taylor & Francis Ltd

ISSN: 1058-4587

Source: Integrated Ferroelectrics, Vol.49, Iss.1, 2002-01, pp. : 21-30

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