CRYSTALLIZATION BEHAVIOR OF HfO2 FILMS FOR (Y,Yb)MnO3/HfO2/Si STRUCTURES

Author: Suzuki Kazuyuki   Kato Kazumi  

Publisher: Taylor & Francis Ltd

ISSN: 1058-4587

Source: Integrated Ferroelectrics, Vol.94, Iss.1, 2007-10, pp. : 3-10

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