Multilevel diffractive elements in SiO2 by electron beam lithography and proportional etching with analogue negative resist

Author： Laakkonen Pasi   Lautanen Jari   Kettunen Ville   Turunen Jari   Schirmer Matthias  

Publisher： Taylor & Francis Ltd

ISSN： 1362-3044

Source： Journal of Modern Optics, Vol.46, Iss.8, 1999-07, pp. : 1295-1307

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