Publisher： Taylor & Francis Ltd
ISSN： 1460-6976
Source： Advances In Physics, Vol.8, Iss.32, 1959-10, pp. : 375-437
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Effects of stress on the interfacial reactions of metal thin films on (001)Si
By Cheng S.L. Lo H.M. Cheng L.W. Chang S.M. Chen L.J.
Thin Solid Films, Vol. 424, Iss. 1, 2003-01 ,pp. :
Access to resources
Recommend
Thin films of intermetallic Cu/Ti compounds and their possible uses
By Uzunov T.D. Stojanov S.P. Lambov S.I.
Vacuum, Vol. 52, Iss. 3, 1999-03 ,pp. :
The nucleation and growth of intermetallic Al-Pt phases in co-deposited thin films
By Kovacs A. Barna P.B. Labar J.L.
Thin Solid Films, Vol. 433, Iss. 1, 2003-06 ,pp. :
Solid state reactions in cobalt/amorphous-silicon multilayer thin films
By Baik H.K. Shim J.Y. Kwak J.S.
Thin Solid Films, Vol. 288, Iss. 1, 1996-11 ,pp. :
Kinetic pathways of diffusion and solid-state reactions in nanostructured thin films
By Beke D.L.
Philosophical Magazine, Vol. 93, Iss. 16, 2013-06 ,pp. :