Study of the effect of different plasma-enhanced chemical vapour deposition reactor configurations on the properties of hydrogenated amorphous silicon thin films

Author： Aguas H.   Silva V.   Ferreira I.   Fortunato E.   Martins R.  

Publisher： Taylor & Francis Ltd

ISSN： 1463-6417

Source： Philosophical Magazine B, Vol.80, Iss.4, 2000-04, pp. : 475-486

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