Iron Oxide Thin Film Deposition on Si(100) Substrate using MOCVD Method

Author： Lee J. -Y.   Kang B. -C.   Boo J. -H.  

Publisher： Taylor & Francis Ltd

ISSN： 1553-3174

Source： Synthesis and Reactivity in Inorganic, Metal-Organic, and Nano-Metal Chemistry, Vol.38, Iss.2, 2008-03, pp. : 217-220

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