Modeling of clusters deposition under the effect of thermophoresis during thermal plasma flash evaporation process

Publisher： IOP Publishing

ISSN： 1468-6996

Source： Science and Technology of Advanced Materials, Vol.2, Iss.2, 2001-06, pp. : 36-43

Access to resources Favorite

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Development of microfabrication process of mesoporous Pt via “Solvent-Evaporation-Mediated Direct Physical Casting”: Selective deposition into sloped microchannels

By  

Science and Technology of Advanced Materials, Vol. 7, Iss. 5, 2006-07 ,pp. : 44-51

IOP Publishing

Access to resources Recommend Favorite

High-rate deposition of nanostructured SiC films by thermal plasma PVD

By  

Science and Technology of Advanced Materials, Vol. 3, Iss. 4, 2002-12 ,pp. : 27-31

IOP Publishing

Access to resources Recommend Favorite

Ultrafast thermal plasma physical vapor deposition of thick SiC films

By  

Science and Technology of Advanced Materials, Vol. 4, Iss. 2, 2003-01 ,pp. : 64-70

IOP Publishing

Access to resources Recommend Favorite

Thermoelectric properties of SiC thick films deposited by thermal plasma physical vapor deposition

By  

Science and Technology of Advanced Materials, Vol. 4, Iss. 2, 2003-01 ,pp. : 71-76

IOP Publishing

Access to resources Recommend Favorite

Tribological and thermal stability study of nanoporous amorphous boron carbide films prepared by pulsed plasma chemical vapor deposition

By  

Science and Technology of Advanced Materials, Vol. 16, Iss. 3, 2015-06 ,pp. : 375-387

IOP Publishing

Access to resources Recommend Favorite