Properties of HfO2 and HfO2: Y films grown by atomic layer deposition in an advanced monocyclopentadienyl-based process

ISSN： 1757-899X

Source： IOP Conference Series: Materials Science and Engineering, Vol.8, Iss.1, 2010-02, pp. : 105-108

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Phase equilibria in the system HfO₂-Y₂O₃-La₂O₃ AT 1900°C

By Andrievskaya E. Lopato L. Smirnov V.

Powder Metallurgy and Metal Ceramics, Vol. 45, Iss. 1-2, 2006-01 ,pp. : 59-71

Springer Publishing Company

Access to resources Recommend Favorite

The Al₂O₃–HfO₂–Y₂O₃ phase diagram. IV. Vertical sections

By Lakiza S. Tishchenko Ya. Red’ko V. Lopato L.

Powder Metallurgy and Metal Ceramics, Vol. 49, Iss. 3-4, 2010-07 ,pp. : 201-206

Springer Publishing Company

Access to resources Recommend Favorite

The Al₂O₃–HfO₂–Y₂O₃ phase diagram. III. Solidus surface and phase equilibria in crystallization of alloys

By Lakiza S. Tishchenko Ya. Lopato L.

Powder Metallurgy and Metal Ceramics, Vol. 49, Iss. 1-2, 2010-05 ,pp. : 71-78

Springer Publishing Company

Access to resources Recommend Favorite

Ab initio study of structural, vibrational and dielectric properties of high-κ HfO2 as a function of doping

IOP Conference Series: Materials Science and Engineering, Vol. 8, Iss. 1, 2010-02 ,pp. : 98-104

IOP Publishing

Access to resources Recommend Favorite

Thermal properties of TiO2 films fabricated by atomic layer deposition

IOP Conference Series: Materials Science and Engineering, Vol. 60, Iss. 1, 2014-06 ,pp. : 57-65

IOP Publishing

Access to resources Recommend Favorite