Publisher: IOP Publishing
ISSN: 1742-6596
Source: Journal of Physics: Conference Series , Vol.100, Iss.1, 2008-03, pp. : 64-67
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Chemical vapour deposition of nitride and oxynitride dielectric films
Le Journal de Physique IV, Vol. 03, Iss. C3, 1993-08 ,pp. :
DIFFUSION REACTIONS BETWEEN SILICON OXYNITRIDE AND SILICON NITRIDE DURING HIP-SYNTHESIS
Le Journal de Physique Colloques, Vol. 49, Iss. C5, 1988-10 ,pp. :
Characterisation of LPCVD silicon oxynitride films by optical spectroscopy
Le Journal de Physique IV, Vol. 11, Iss. PR3, 2001-08 ,pp. :
Structural characterization of cubic silicon nitride
By Jiang J. Z. Ståhl K. Berg R. W. Frost D. J. Zhou T. J. Shi P. X.
EPL (EUROPHYSICS LETTERS), Vol. 51, Iss. 1, 2010-03 ,pp. :