ECWR plasma enhanced chemical vapour deposition of microcrystalline silicon thin films

Publisher： IOP Publishing

ISSN： 1742-6596

Source： Journal of Physics: Conference Series , Vol.550, Iss.1, 2014-11, pp. : 257-264

Access to resources Favorite

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Development of a hollow cathode plasma source for microcrystalline silicon thin films deposition

By  

Journal of Physics: Conference Series , Vol. 275, Iss. 1, 2011-01 ,pp. : 116-123

IOP Publishing

Access to resources Recommend Favorite

REMOTE PLASMA CHEMICAL VAPOUR DEPOSITION OF SILICON NITRIDE FILMS

By  

Le Journal de Physique IV, Vol. 02, Iss. C2, 1991-09 ,pp. : C2-847-C2-847

Edp Sciences

Access to resources Recommend Favorite

Remote plasma chemical vapour deposition of silicon nitride films

By  

Journal de Physique III, Vol. 2, Iss. 8, 1992-08 ,pp. : 1421-1429

Edp Sciences

Access to resources Recommend Favorite

Plasma-enhanced chemical vapour deposition and structural characterization of amorphous chalcogenide films

By  

Le Journal de Physique IV, Vol. 09, Iss. PR8, 1999-09 ,pp. : Pr8-717-Pr8-724

Edp Sciences

Access to resources Recommend Favorite

Plasma-Enhanced Chemical Vapour Deposition of Amorphous Se Films

By  

Le Journal de Physique IV, Vol. 05, Iss. C5, 1995-06 ,pp. : C5-1109-C5-1115

Edp Sciences

Access to resources Recommend Favorite