Author: Zhang J Markosyan A H Seeger M van Veldhuizen E M van Heesch E J M Ebert U
Publisher: IOP Publishing
E-ISSN: 1361-6595|24|2|25008-25023
ISSN: 0963-0252
Source: Plasma Sources Science and Technology, Vol.24, Iss.2, 2015-04, pp. : 25008-25023
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Abstract
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