Atmospheric Pressure Plasma Initiated Chemical Vapor Deposition Using Ultra‐Short Square Pulse Dielectric Barrier Discharge

Publisher： John Wiley & Sons Inc

E-ISSN： 1612-8869|12|1|66-74

ISSN： 1612-8850

Source： PLASMA PROCESSES AND POLYMERS (ELECTRONIC), Vol.12, Iss.1, 2015-01, pp. : 66-74

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