Patterning: N2‐Plasma‐Assisted One‐Step Alignment and Patterning of Graphene Oxide on a SiO2/Si Substrate Via the Langmuir–Blodgett Technique (Adv. Mater. Interfaces 5/2015)

Publisher: John Wiley & Sons Inc

E-ISSN: 2196-7350|2|5|n/a-n/a

ISSN: 2196-7350

Source: ADVANCED MATERIALS INTERFACES (ELECTRONIC), Vol.2, Iss.5, 2015-03, pp. : n/a-n/a

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