CFD Simulation of Chemical Vapor Deposition of Silicon Carbide in CH3SiCl3-H2 System

Publisher: Bentham Science Publishers

E-ISSN: 1875-6786|10|1|135-137

ISSN: 1573-4137

Source: Current Nanoscience, Vol.10, Iss.1, 2014-02, pp. : 135-137

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Abstract