Impact of P/In flux ratio and epilayer thickness on faceting for nanoscale selective area growth of InP by molecular beam epitaxy

Author: Fahed M   Desplanque L   Coinon C   Troadec D   Wallart X  

Publisher: IOP Publishing

E-ISSN: 1361-6528|26|29|295301-295308

ISSN: 0957-4484

Source: Nanotechnology, Vol.26, Iss.29, 2015-07, pp. : 295301-295308

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