The impact of porosity on the formation of manganese based copper diffusion barrier layers on low-κ dielectric materials

Author： McCoy A P   Bogan J   Walsh L   Byrne C   O’Connor R   Woicik J C   Hughes G  

Publisher： IOP Publishing

E-ISSN： 1361-6463|48|32|325102-325106

ISSN： 0022-3727

Source： Journal of Physics D: Applied Physics, Vol.48, Iss.32, 2015-08, pp. : 325102-325106

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