Residual stress relaxation mechanism at low homologous temperature in nanocrystalline iron thin film deposited on Si (1 0 0) substrate

Author: Chakravarty Sujay   Gangavarapu Amarendra   Parida Pradyumna   Dasgupta Arup   Chakravarty Sujay  

Publisher: IOP Publishing

E-ISSN: 1361-6463|48|30|305303-305310

ISSN: 0022-3727

Source: Journal of Physics D: Applied Physics, Vol.48, Iss.30, 2015-08, pp. : 305303-305310

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