Electric field assisted diffusion of hydrogen in a-Si:H thin films during hydrogen plasma etching

Author： Hadjadj Aomar Larbi Fadila Gilliot Mickaël Jbara Omar

E-ISSN： 1361-6463|48|27|275501-275508

ISSN： 0022-3727

Source： Journal of Physics D: Applied Physics, Vol.48, Iss.27, 2015-06, pp. : 275501-275508

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