Control of carbon content in amorphous GeTe films deposited by plasma enhanced chemical vapor deposition (PE-MOCVD) for phase-change random access memory applications

Author: Aoukar M   Szkutnik P D   Jourde D   Pelissier B   Michallon P   Noé P   Vallée C  

Publisher: IOP Publishing

E-ISSN: 1361-6463|48|26|265203-265212

ISSN: 0022-3727

Source: Journal of Physics D: Applied Physics, Vol.48, Iss.26, 2015-07, pp. : 265203-265212

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