Controlled MoS2 layer etching using CF4 plasma

Author: Min Hwan Jeon   AhnChisung   KimHyeongU   Kyong Nam Kim   Tai Zhe LiN   QinHongyi   KimYeongseok   LeeSehan   KimTaesung   Geun Young Yeom  

Publisher: IOP Publishing

E-ISSN: 1361-6528|26|35|355706-355713

ISSN: 0957-4484

Source: Nanotechnology, Vol.26, Iss.35, 2015-09, pp. : 355706-355713

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