Tailored Height Gradients in Vertical Nanowire Arrays via Mechanical and Electronic Modulation of Metal‐Assisted Chemical Etching

Publisher： John Wiley & Sons Inc

E-ISSN： 1613-6829|11|33|4201-4208

ISSN： 1613-6810

Source： SMALL, Vol.11, Iss.33, 2015-09, pp. : 4201-4208

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Metal‐assisted chemical etching of CIGS thin films for grain size analysis

By  

PHYSICA STATUS SOLIDI - RAPID RESEARCH LETTERS (ELECTRONIC), Vol. 10, Iss. 9, 2016-09 ,pp. : 673-676

John Wiley & Sons Inc

Access to resources Recommend Favorite

Fabrication of Silicon Nanowire Arrays by Macroscopic Galvanic Cell‐Driven Metal Catalyzed Electroless Etching in Aerated HF Solution

By  

ADVANCED MATERIALS, Vol. 26, Iss. 9, 2014-03 ,pp. : 1410-1413

John Wiley & Sons Inc

Access to resources Recommend Favorite

Efficient nanostructured ‘black’ silicon solar cell by copper‐catalyzed metal‐assisted etching

By  

PROGRESS IN PHOTOVOLTAICS: RESEARCH & APPLICATIONS, Vol. 1062-7995, Iss. 10, 2015-10 ,pp. : 1375-1380

John Wiley & Sons Inc

Access to resources Recommend Favorite

Efficient nanostructured ‘black’ silicon solar cell by copper‐catalyzed metal‐assisted etching

By  

PROGRESS IN PHOTOVOLTAICS: RESEARCH & APPLICATIONS, Vol. 23, Iss. 10, 2015-10 ,pp. : 1375-1380

John Wiley & Sons Inc

Access to resources Recommend Favorite

Wafer‐Scale Precise Patterning of Organic Single‐Crystal Nanowire Arrays via a Photolithography‐Assisted Spin‐Coating Method

By  

ADVANCED MATERIALS, Vol. 27, Iss. 45, 2015-12 ,pp. : 7305-7312

John Wiley & Sons Inc

Access to resources Recommend Favorite