Directed Self‐Assembly of Poly(2‐vinylpyridine)‐b‐polystyrene‐b‐poly(2‐vinylpyridine) Triblock Copolymer with Sub‐15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template

Publisher： John Wiley & Sons Inc

E-ISSN： 1521-4095|27|29|4364-4370

ISSN： 0935-9648

Source： ADVANCED MATERIALS, Vol.27, Iss.29, 2015-08, pp. : 4364-4370

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