Photoinduced Colossal Magnetoresistance under Substantially Reduced Magnetic Field

Publisher: John Wiley & Sons Inc

E-ISSN: 1616-3028|25|31|5030-5037

ISSN: 1616-301x

Source: ADVANCED FUNCTIONAL MATERIALS, Vol.25, Iss.31, 2015-08, pp. : 5030-5037

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