Vertically Oriented, Three‐Dimensionally Tapered Deep‐Subwavelength Metallic Nanohole Arrays Developed by Photofluidization Lithography

Publisher: John Wiley & Sons Inc

E-ISSN: 1521-4095|26|44|7521-7528

ISSN: 0935-9648

Source: ADVANCED MATERIALS, Vol.26, Iss.44, 2014-11, pp. : 7521-7528

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract